Mahindra Maximile EFO,Mahindra Maximile Ultra Cool Coolant,Maximile Syntec FZ,Castrol Protector ser
Indian Army
RAJAURI, JAMMU & KASHMIR
Bid Publish Date
15-Dec-2025, 6:19 pm
Bid End Date
12-Jan-2026, 7:00 pm
EMD
₹40,000
Progress
Quantity
20504
Category
Al2O3 Target
Bid Type
Two Packet Bid
Indian Institute Of Technology (iit) invites bids for Al2O3 Target, BaTiO3 Target, AZ 15nXT 115 CPS, AZ 15nXT 450 CPS, AZ 351B Developer, AZ 2026MIF Developer, AZ10XT Positive PR 520cP, AZ4500 Series Positive PR AZ 4533, Gold Etchant, 2. 38 PERCENT TMAH, SU-8 Negative PR GM 1060, PGMEA Developer for SU-8, Stripper for SU-8, PMMA Positive PR A4, PMMA Dev3 MIBK IPA 1 ISTO3, PMMA Stripper Acetone, Reagent Grade. Quantity: 20504. Submission Deadline: 12-01-2026 19: 00: 00. Submit your proposal before the deadline.
Indian Army
RAJAURI, JAMMU & KASHMIR
Directorate Of Purchase And Stores
MUMBAI, MAHARASHTRA
National Institute Of Mental Health And Neuro Sciences (nimhans)
BANGALORE, KARNATAKA
Rourkela Steel Plant
SUNDERGARH, ODISHA
Indian Army
SONITPUR, ASSAM
Tender Results
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| Item # | Title | Description | Quantity | Unit | Consignee | Delivery (Days) |
|---|---|---|---|---|---|---|
| 1 | Al2O3 Target | Diameter 4 inches, Thickness 3 mm, Purity 99.99 %, With Copper back Plate | 2 | nos | dipakgoswamisric | 50 |
| 2 | BaTiO3 Target | Diameter 4 inches, Thickness 3 mm, Purity 99.99 %, With Copper back Plate | 2 | nos | dipakgoswamisric | 50 |
| 3 | AZ 15nXT 115 CPS | Negative Acting Thick Resist for Cu RDL, TSV, and other plating & etch applications | 500 | ml | dipakgoswamisric | 50 |
| 4 | AZ 15nXT 450 CPS | Negative Acting Thick Resist for Cu RDL, TSV, and other plating & etch applications | 500 | ml | dipakgoswamisric | 50 |
| 5 | AZ 351B Developer | General purpose developer for use with almost any positive AZ Photoresist, Odourless, aqueous, inorganic, alkaline solution, free of phosphates. | 5,000 | ml | dipakgoswamisric | 50 |
| 6 | AZ 2026MIF Developer | Metal Ion Free Developers, High Contrast, Ultra-high purity tetramethyl | 5,000 | ml | dipakgoswamisric | 50 |
| 7 | AZ10XT Positive PR 520cP | Thick positive tone photoresists for plating applications featuring improved sidewall profiles | 500 | ml | dipakgoswamisric | 50 |
| 8 | AZ4500 Series Positive PR AZ 4533 | PHYSICAL and CHEMICAL PROPERTIES | 500 | ml | dipakgoswamisric | 50 |
| 9 | Gold Etchant | Appearance Color Red to Brown | 1,000 | ml | dipakgoswamisric | 50 |
| 10 | 2.38 PERCENT TMAH | vapor pressure 17.5 mmHg | 500 | ml | dipakgoswamisric | 50 |
| 11 | SU-8 Negative PR GM 1060 | Negative tone epoxy photoresist, specifically designed for thin layers and high aspect ratio structures. | 500 | ml | dipakgoswamisric | 50 |
| 12 | PGMEA Developer for SU-8 | PGMEA Developer for above mentioned SU-8 | 2,000 | ml | dipakgoswamisric | 50 |
| 13 | Stripper for SU-8 | Stripper for above mentioned SU-8 | 1,000 | ml | dipakgoswamisric | 50 |
| 14 | PMMA Positive PR A4 | Versatile, positive tone electron beam resist. Molecular weight 950,000 | 500 | ml | dipakgoswamisric | 50 |
| 15 | PMMA Dev3 MIBK IPA 1 ISTO3 | Composition 1 ISTO 3 MIBK BY IPA | 2,000 | ml | dipakgoswamisric | 50 |
| 16 | PMMA Stripper Acetone, Reagent Grade | PMMA Stripper Acetone, Reagent Grade for above grade PMMA | 1,000 | ml | dipakgoswamisric | 50 |
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Experience Criteria
Past Performance
Bidder Turnover
Certificate (Requested in ATC)
OEM Authorization Certificate
OEM Annual Turnover
Additional Doc 1 (Requested in ATC)
Additional Doc 2 (Requested in ATC)
Additional Doc 3 (Requested in ATC)
Additional Doc 4 (Requested in ATC)
Compliance of BoQ specification and supporting document *In case any bidder is seeking exemption from Experience / Turnover Criteria
the supporting documents to prove his eligibility for exemption must be uploaded for evaluation by the buyer
Extended Deadline
12-Jan-2026, 7:00 pm
Opening Date
12-Jan-2026, 7:30 pm
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Main Document
BOQ
BOQ
GEM_GENERAL_TERMS_AND_CONDITIONS